Abstract:
The influence of the carrier-gas type on the character of formation of $p$-GaN layers on the faces (0001), $(11\bar20)$, and $(11\bar22)$ of a mesa-stripe structure, formed by the selective-area epitaxy method. A light-emission diode having a rectangular cross section with an active region made of InGaN/GaN quantum wells was formed on the $(0001)$ and $(11\bar20)$ faces of the mesa stripe structure. LED prototypes on free GaN stripes detached from the substrate were created.