Abstract:
For the first time, the growth of epitaxial twin-free nickel films on barium fluoride (BaF$_2$) substrates using magnetron sputtering has been demonstrated. It has been established that optimizing deposition conditions, including substrate temperature, working gas pressure, and sputtering power, enables the achievement of high structural perfection in the films. The obtained results open prospects for the application of such structures in magnetic and electronic devices.
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