Abstract:
The article describes the results of researching and calculation of total depletion-layer capacitance of high-voltage, mesaepitaxial diodes. It is shown how influences of peripheral of “mesa”-region for magnitude of total depletion-layer capacitance of $p$–$n$-junction in mesaepitaxial diodes struc-tures it. Proposed of the analytical model of total depletion-layer capacitance of high-voltage, mesaepitaxial diodes structures, taking into account of the capacitance of peripheral of “mesa”-region. The relations obtained of self-consistent of the analytical equations for the depletion-layer capacitance of “mesa”-region for two options: for inclination angle constant of “mesa”-chamfer; for variable angle inclination of “mesa”-chamfer.