RUS  ENG
Full version
JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015 Volume 41, Issue 23, Pages 89–94 (Mi pjtf7911)

This article is cited in 5 papers

Fabrication of quasi-superlattices at the interface between 3C-SiC epitaxial layer and substrates of hexagonal SiC polytypes by sublimation epitaxy in vacuum

A. A. Lebedevab, S. Yu. Davydovab, L. M. Sorokina, L. V. Shakhova

a Ioffe Institute, St. Petersburg
b St. Petersburg National Research University of Information Technologies, Mechanics and Optics

Abstract: Transmission electron microscopy has been used to study the structure of a transition layer between a hexagonal substrate (6H-SiC and 4H-SiC) and a cubic silicon carbide layer grown by sublimation epitaxy in vacuum. It is shown by microdiffraction analysis that the transition layer with a thickness of 210 nm is constituted by alternating layers of cubic (3C) and hexagonal (6H) silicon carbide. It is demonstrated that 6H-SiC/3C-SiC and 4H-SiC/3C-SiC quasi-superlattices can be produced by this method.

Received: 30.07.2015


 English version:
Technical Physics Letters, 2015, 41:12, 1156–1158

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2026