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JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive
Pisma v Zhurnal Tekhnicheskoi Fiziki, 1985 Volume 11, Issue 4, Pages 227–229 (Mi pjtf785)
Some technological aspects of sulfur diffusion in silicon

E. G. Guk, A. V. El'tsov, S. F. Luizova, V. B. Shuman, T. A. Yurre

Ioffe Physico-Technical Institute USSR Academy of Sciences, Leningrad

Received: 19.11.1984



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