Field-ion microscopy of the boundary region of metal interfaces

V. A. Ivchenko<sup>ab

a</sup> Ural Federal University named after the First President of Russia B. N. Yeltsin, Ekaterinburg
^b Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Ekaterinburg

Abstract: The atomic structure of boundary regions at interfaces in metal samples subjected to intense external action has been studied by field-ion microscopy (FIM). An analysis of data obtained by FIM, atom-probe FIM, and atom-probe tomography on the atomic structure of planar defects in the samples with metal interfaces upon irradiation and the action of other factors shows that their boundary regions have different widths within 0.8–1.5 nm, depending on the type and intensity of external action. Experimental data on the elemental composition of phase interfaces in mechanically alloyed compounds (Cu$_{80}$Co$_{20}$) and doped alloys (Cu$_3$Au + 4 at% Pt) are presented.

Received: 02.03.2015

 English version: Technical Physics Letters, 2015, 41:8, 784–787

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