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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2015 Volume 41, Issue 13, Pages 72–78 (Mi pjtf7767)

This article is cited in 2 papers

The waveguide effect of InGaAs quantum wells in a GaAs structure on Si substrate with Ge buffer layer

V. Ya. Aleshkinab, N. V. Dikarevac, A. A. Dubinovab, B. N. Zvonkovc, K. E. Kudryavtsevab, S. M. Nekorkinc, A. V. Novikovab, P. A. Yuninab, D. V. Yurasovab

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b Lobachevsky State University of Nizhny Novgorod
c Scientific-Research Physicotechnical Institute at the Nizhnii Novgorod State University, Nizhnii Novgorod

Abstract: The waveguide effect of InGaAs quantum wells in a GaAs structure grown on a Si substrate with a relaxed Ge buffer layer has been studied. After an excitation power density of 35 kW/cm$^2$ was reached at liquid-nitrogen temperature, several stimulated emission lines were observed in the energy range of 1350–1360 meV.

Received: 17.11.2014


 English version:
Technical Physics Letters, 2015, 41:7, 648–650

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