This article is cited in 4 papers

Influence of the microwave plasma deposition regime on the field-electron emission characteristics of nanodiamond-graphite composite films

N. A. Bushuev^a, P. D. Shalaev^a, A. R. Yafarov^a, R. K. Yafarov<sup>b

a</sup> State Scientific-Production Enterprise ``Almaz'', Saratov
^b Saratov Branch, Kotel'nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences

Abstract: It is established that the field-electron emission characteristics of nanodiamond-graphite composite films deposited in nonequilibrium microwave plasma of low-pressure ethanol vapor depend on the deposition regime. The effect is explained in terms of the cluster model of deposited hydrogenated amorphous carbon ($a$-C:H) structure. By selecting a deposition regime so as to reduce the content of bound hydrogen in deposited carbon structures, it is possible to provide for a four- to sixfold decrease in the threshold field of field-electron emission as compared to that in $a$-C:H films obtained by other methods.

Received: 08.12.2014

 English version: Technical Physics Letters, 2015, 41:5, 489–492

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