Abstract:
A growth equation for III–V nanomembranes (NMs) fabricated on patterned substrates with one-dimensional array of trenches is derived considering the re-emitted flux of group V species. It is shown that the NM height increases with the pitch of trenches and for narrower trenches. Overall, the growth kinetics and the resulting morphology of III–V NMs on reflecting substrates is very different from those on adsorbing substrates, which should be carefully accounted for in the growth experiments.