S. A. Kukushkin, A. V. Osipov, “The Gorsky effect in the synthesis of silicon-carbide films from silicon by topochemical substitution of atoms”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2017, Volume 43, Issue 13,Pages <nobr>81

This article is cited in 17 papers

The Gorsky effect in the synthesis of silicon-carbide films from silicon by topochemical substitution of atoms

S. A. Kukushkin^abc, A. V. Osipov^ab

^a Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, St. Petersburg
^b St. Petersburg National Research University of Information Technologies, Mechanics and Optics
^c Peter the Great St. Petersburg Polytechnic University

Abstract: The mechanisms of evaporation of silicon from the surface of silicon carbide (SiC) grown by atomic substitution are studied. It is assumed that the emergence of elastic deformations at the stage of cooling of the sample with a SiC film is one of the causes of Si evaporation. It is demonstrated theoretically that elastic stresses induce the mechanochemical Gorsky effect in the SiC layer. This effect initiates redistribution of Si and C atoms in the SiC layer, which results in violation of the stoichiometry of films and asymmetry of their composition over the SiC-layer thickness. A method for growing epitaxial SiC films with a homogeneous composition and a low density of silicon vacancies from a gas mixture of carbon monoxide and trichlorosilane is proposed.

Received: 30.12.2016

DOI: 10.21883/PJTF.2017.13.44815.16625