RUS  ENG
Full version
JOURNALS // Pisma v Zhurnal Tekhnicheskoi Fiziki // Archive

Pisma v Zhurnal Tekhnicheskoi Fiziki, 2017 Volume 43, Issue 2, Pages 18–23 (Mi pjtf6012)

This article is cited in 22 papers

Polishing superhard material surfaces with gas-cluster ion beams

A. E. Ieshkina, K. D. Kushkinaa, D. S. Kireeva, Yu. A. Ermakovb, V. S. Chernyshab

a Lomonosov Moscow State University
b Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics

Abstract: We have studied the influence of bombardment with accelerated gas-cluster ions on the surface topography of silicon carbide and diamond. Atomic-force microscopy shows that exposure to 10-keV gas-cluster ions at a total dose above 10$^{16}$ cm$^{-2}$ leads to smoothing of the surface relief. The ion-etching rate and efficiency of the surface relief smoothing as dependent on the thickness of removed layer have been estimated. Raman-spectroscopy data show that surface irradiation with gas-cluster ions does not introduce defects into the crystalline structure of irradiated material.

Received: 16.08.2016

DOI: 10.21883/PJTF.2017.02.44182.16459


 English version:
Technical Physics Letters, 2017, 43:1, 95–97

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2026