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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2017 Volume 43, Issue 6, Pages 15–22 (Mi pjtf5962)

This article is cited in 7 papers

The influence of photoelectron processes in a semiconductor substrate on the adsorption of polycationic and polyanionic molecules

S. V. Stetsyura, A. V. Kozlowski

Saratov State University

Abstract: White-light illumination during the adsorption of polyanionic molecules of glucose oxidase (GO$_x$) enzyme on the surface of $p$-Si/SiO$_{2}$/polyethylenimine structure leads to a threefold decrease in the surface concentration of GO$_x$ molecules. Same illumination during the GO$_x$ adsorption on the $n$-Si/SiO$_{2}$/PEI structure leads to a sevenfold increase in the surface concentration of enzyme molecules. Changes in the amount of adsorbed GO$_x$ molecules depending on the intensity of irradiation are explained by electron transfer processes and recharging of electronic states at the Si/SiO$_2$ interface and within SiO$_2$ layer.

Received: 29.09.2016

DOI: 10.21883/PJTF.2017.06.44399.16510


 English version:
Technical Physics Letters, 2017, 43:3, 285–288

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