This article is cited in 2 papers

Nanostructuring at oblique angle deposition of aluminum

O. S. Trushin^a, A. A. Popov^a, A. N. Pestova^a, L. A. Mazaletsky^a, A. A. Akulov<sup>b

a</sup> Yaroslavl branch of the Institute of physics and technology, Institution of Russian academy of sciences
^b P.G. Demidov Yaroslavl State University

Abstract: Formation of regular arrays of nanorods with high aspect ratio (length to transverse size) has been found in the process of Al thin film growth at oblique angle deposition on silicon substrate by the method of electron beam evaporation. It was found that the optimal conditions for nanostructuring are realized at the inclination angle larger than 80 degrees.

Keywords: aluminum film, electron beam evaporation, oblique deposition, shadowing effect, nanostructuring.

Received: 01.03.2021
Revised: 22.03.2021
Accepted: 23.03.2021

DOI: 10.21883/PJTF.2021.12.51064.18748

 English version: Technical Physics Letters, 2021, 47:8, 617–619

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