I. G. Atabaev, M. U. Khazhiev, N. A. Matchanov, T. M. Saliev, K. A. Bobojonov, “Effect of surface chemical treatments on Ti–$p$-Si$_{1-x}$Ge$_x$ and Ni–$p$-Si$_{1-x}$Ge$_x$ contact properties”, Fizika i Tekhnika Poluprovodnikov, 2010, Volume 44, Issue 12,Pages 1655

Manufacturing, processing, testing of materials and structures

Effect of surface chemical treatments on Ti–$p$-Si$_{1-x}$Ge$_x$ and Ni–$p$-Si$_{1-x}$Ge$_x$ contact properties

I. G. Atabaev, M. U. Khazhiev, N. A. Matchanov, T. M. Saliev, K. A. Bobojonov

Physical-Technical Institute, Uzbekistan Academy of Sciences

Abstract: The effect of various chemical treatments of the alloy surface on the properties of Ti–$p$-SiGe and Ni–$p$-SiGe contacts fabricated by vacuum thermal deposition at a substrate temperature of 350–400$^\circ$C has been studied. Etching under various conditions is used to form an initial surface with various surface-state densities. It is shown that an intermediate nickel germanosilicide layer is formed in nickel-based structures during thermal deposition of contacts, which has a significant effect on the current-voltage and capacitance-voltage characteristics of structures.

Received: 15.03.2010
Accepted: 29.04.2010