Abstract:
The features of platinum film formation on $n$-6H-SiC substrates were experimentally studied for different methods of pulsed laser deposition, i.e., by both the conventional method in vacuum and in an inert gas atmosphere. In the latter case, a disk screen was placed on the plume expansion axis between the laser target and substrate to protect the latter from micrometer and submicrometer particles. A numerical model of such a process was developed, which makes it possible to predict the deposited film distribution over the substrate surface, energy and angular parameters of the atomic flow as laser plume properties, inert gas pressure, and screen position are varied. Simulation results were used to explain electrical properties of Pt/$n$-6H-SiC thin-film structures fabricated by different methods.