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Fizika i Tekhnika Poluprovodnikov, 2010 Volume 44, Issue 3, Pages 310–319 (Mi phts8765)

This article is cited in 13 papers

Electronic and optical properties of semiconductors

Features of an intermetallic $n$-ZrNiSn semiconductor heavily doped with atoms of rare-earth metals

V. A. Romakaab, D. Fruchartc, E. K. Hlilc, R. E. Gladyshevskiid, D. Gignouxc, V. V. Romakad, B. C. Kuzhel'd, R. V. Krayjvskiib

a Ya. S. Pidstryhach Institute for Applied Problems of Mechanics and Mathematics, NAS Ukraine, L'vov
b Lviv Polytechnic National University
c Institute Néel, CNRS, BP 166, Grenoble, 38042, France
d Ivan Franko National University of L'viv

Abstract: The crystal structure, density of electron states, electron transport, and magnetic characteristics of an intermetallic $n$-ZrNiSn semiconductor heavily doped with atoms of rare-earth metals (R) have been studied in the ranges of temperatures 1.5–400 K, concentrations of rare-earth metal 9.5 $\times$ 10$^{19}$–9.5 $\times$ 10$^{21}$ cm$^{-3}$, and magnetic fields $H\le$ 15 T. The regions of existence of Zr$_{1-x}$R$_x$NiSn solid solutions are determined, criteria for solubility of atoms of rare-earth metals in ZrNiSn and for the insulator-metal transition are formulated, and the nature of “a priori doping” of ZrNiSn is determined as a result of redistribution of Zr and Ni atoms at the crystallographic sites of Zr. Correlation between the concentration of the R impurity, the amplitude of modulation of the bands of continuous energies, and the degree of occupation of potential wells of small-scale fluctuations with charge carriers is established. The results are discussed in the context of the Shklovskii–Efros model of a heavily doped and compensated semiconductor.

Received: 16.06.2009
Accepted: 30.06.2009


 English version:
Semiconductors, 2010, 44:3, 293–302

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