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Fizika i Tekhnika Poluprovodnikov, 2011 Volume 45, Issue 2, Pages 183–191 (Mi phts8457)

This article is cited in 2 papers

Semiconductor structures, low-dimensional systems, quantum phenomena

Trapping of charge carriers into InAs/AlAs quantum dots at liquid-helium temperature

D. S. Abramkin, K. S. Zhuravlev, T. S. Shamirzaev, A. V. Nenashev, A. K. Kalagin

Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk

Abstract: The problem of how the probability of trapping of charge carriers into quantum dots via the wetting layer influences the steady-state and time-dependent luminescence of the wetting layer and quantum dots excited via the matrix is analyzed in the context of some simple models. It is shown that the increase in the integrated steady-state luminescence intensity of quantum dots with increasing area fraction occupied by the quantum dots in the structure is indicative of the suppression of trapping of charge carriers from the wetting layer into the quantum dots. The same conclusion follows from the independent decays of the time-dependent luminescence signals from the wetting layer and quantum dots. The processes of trapping of charge carriers into the InAs quantum dots in the AlAs matrix at 5 K are studied experimentally by exploring the steady-state and time-dependent photoluminescence. A series of structures with different densities of quantum dots has been grown by molecular-beam epitaxy on a semi-insulating GaAs (001) substrate. It is found that the integrated photoluminescence intensity of quantum dots almost linearly increases with increasing area occupied with the quantum dots in the structure. It is also found that, after pulsed excitation, the photoluminescence intensity of the wetting layer decays more slowly than the photoluminescence intensity of the quantum dots. According to the analysis, these experimental observations suggest that trapping of excitons from the wetting layer into the InAs/AlAs quantum dots at 5 K is suppressed.

Received: 20.05.2010
Accepted: 02.06.2010


 English version:
Semiconductors, 2011, 45:2, 179–187

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