Abstract:
InAsP and GaInAsP layers were grown on InP sub- strates using the metal-organic vapor-phase epitaxy method. The studies conducted using the photoluminescence, X-ray diffractometry, and energy-dispersive X-ray spectroscopy methods allowed us to determine the conditions for growing Ga$_{0.26}$In$_{0.74}$As$_{0.5}$P$_{0.5}$ layers with $\Delta a/a$ = 2000 ppm and a band gap of 1.04 eV (absorption edge 1190 nm). Based on these layers, a laser radiation photocon- verter structure for $\lambda$ = 1064 nm was grown. The measurements and calculations made it possible to predict the efficiency of such a structure at a level of 40% at a laser radiation incident power density of $\lambda$ = 1064 nm up to 30–50 W/cm$^2$.