Abstract:
A new correlation has been established between the structural (surface roughness and grain size), mechanical (mechanical strength, elastic modulus), and optical (absorption coefficient) properties of MoSiN at different annealing temperatures. Thin-film MoSiN layers were deposited by magnetron sputtering in a nitrogen argon gas atmosphere. During the experiment, a circular MoSiN membrane structure was fabricated by group technology. Atomic force microscopy determined the roughness of the as- deposited film to be 1.5 $\pm$ 0.1 nm. Using the ImageJ software and SEM images, the average grain size of the initial MoSiN was calculated as 22 nm. The Young’s modulus of MoSiN was found to be 96 GPa. Using a mechanical testing setup, the critical pressure was measured as 0.05 $\pm$ 0.003 GPa for 10 samples. The mechanical strength of the MoSiN structure was calculated as 1.15 GPa. The absorption coefficient exhibited only minor variation within the wavelength range of 400–900 nm. To study possible changes in the material properties during photolithography, a simulation of the process in the form of additional thermal treatment of MoSiN was carried out.
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