Abstract:
The paper presents the results of a study of thick layers of cubic silicon carbide polytype grown using 6H-SiC/3C-SiC(001) composite substrates of our own manufacture. The layers were grown by the sublimation method in a vacuum chamber in the temperature range of 1600–1800$^\circ$C. The study was carried out using optical and transmission electron microscopy and was aimed to characterize the stability of growing a layer of cubic silicon carbide with the orientation (001). An analysis of the defect structure of the layer is presented in comparison with a layer of silicon carbide with the orientation (111), obtained on a wafer of a hexagonal polytype.