Abstract:
The results of studying the characteristics of optical emission in various regions of quantum-confined silicon $p^+$–$n$ heterojunctions heavily doped with boron are analyzed. The results obtained allow one to conclude that near-infrared electroluminescence arises near the heterointerface between the nanostructured wide-gap silicon $p^+$-barrier heavily doped with boron and $n$-type silicon (100), the formation of which included the active involvement of boron dipole centers.