This article is cited in 16 papers

Manufacturing, processing, testing of materials and structures

Optical properties of ITO films obtained by high-frequency magnetron sputtering with accompanying ion treatment

P. N. Krilov, R. M. Zakirova, I. V. Fedotova

Udmurt State University, Izhevsk

Abstract: A variation in the properties of indium-tin-oxide (ITO) films obtained by the method of reactive magnetron sputtering with simultaneous ion treatment is reported. The ITO films feature the following parameters in the optical range of 450–1100 nm: a transmission coefficient of 80%, band gap of 3.50–3.60 eV, and a refractive index of 1.97–2.06. All characteristics of the films depend on the ion-treatment current. The latter, during the course of deposition, reduces the resistivity of the ITO films with the smallest value of the resistivity being equal to 2 $\times$ 10$^{-3}$ $\Omega$ cm. The degradation of films with a high resistivity when kept in air is observed.

Received: 28.01.2013
Accepted: 04.02.2013

 English version: Semiconductors, 2013, 47:10, 1412–1415

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