This article is cited in 7 papers

Manufacturing, processing, testing of materials and structures

Effect of ion treatment on the properties of In$_2$O$_3$ : Sn films

P. N. Krilov^a, R. M. Zakirova^a, I. V. Fedotova^a, F. Z. Gilmutdinov<sup>b

a</sup> Udmurt State University, Izhevsk
^b Physical-Technical Institute Ural Branch of RAS

Abstract: Variations in the properties of Indium-Tin-Oxide (ITO) films grown by reactive HF (high-frequency) magnetron deposition with simultaneous ion treatment are studied depending on the ion-treatment current and substrate temperature. Ion treatment of the growing film during deposition insignificantly changes the relative content of tin and indium, but significantly increases the conductivity. Films obtained at a temperature below 50$^\circ$C without ion treatment are X-ray amorphous. Ion treatment and an increase in the condensation temperature lead to film crystallization and a shift of the optical absorption edge to short wave-lengths. An increase in the ion-treatment current causes texture formation.

Received: 01.08.2012
Accepted: 28.08.2012

 English version: Semiconductors, 2013, 47:6, 870–874

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