Abstract:
The specific features of generation processes occurring in Si–SiO$_2$ structures in the presence of a strong electric field in the oxide layer ($E_{\mathrm{ox}}\approx$ 10 MV cm$^{-1}$) are considered. It is shown that, after a certain threshold electric-field strength is reached, an additional mechanism of minority charge-carrier generation, associated with the development of electroluminescence processes in the oxide layer, becomes operative.