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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 7, Pages 963–969 (Mi phts7653)

Semiconductor physics

Effect of neutron irradiation on the structure of silicon $p$$n$ junctions of voltage limiters

A. Z. Rahmatov

OAS "Foton", Tashkent

Abstract: Changes in capacitance-voltage characteristics of $p$$n$ junctions with a linear or close-to-linear uncompensated charge distribution under neutron irradiation are analyzed. It is confirmed that an intrinsic conductivity region is formed near the $p$$n$ junction due to such exposure. Empirical formulas are derived which describe the dependence of the sizes of this region and the effective concentration gradient of uncompensated charge on the neutron fluence in a wide range of initial (before neutron irradiation) concentration gradients (from 3 $\times$ 10$^{18}$ to 2 $\times$ 10$^{20}$ cm$^{-4}$) and initial silicon resistivities (from 0.3 to 2 $\Omega$ cm).

Received: 17.07.2013
Accepted: 02.09.2013


 English version:
Semiconductors, 2014, 48:7, 935–941

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