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Fizika i Tekhnika Poluprovodnikov, 2014 Volume 48, Issue 1, Pages 61–66 (Mi phts7484)

This article is cited in 8 papers

Semiconductor physics

Optimization of the deposition technique of thin ITO films used as transparent conducting contacts for blue and near-UV LEDs

I. P. Smirnovaab, L. K. Markovab, A. S. Pavluchenkoab, M. V. Kukushkinbc, S. I. Pavlova

a Ioffe Institute, St. Petersburg
b Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences, St. Petersburg
c TETIS Innovation Company ZAO, St. Petersburg, 194156, Russia

Abstract: Structural, optical, and electrical properties of indium-tin oxide (ITO) films produced by electron-beam evaporation, magnetron sputtering, and a combined method are studied. It is demonstrated that, despite the high transparency of the electron-beam-deposited ITO films in the visible spectral range, their conductivity and refractive index are noticeably lower than the respective parameters of ITO films deposited by magnetron sputtering. A technique for the fabrication of double-layer systems by the combination of these two deposition techniques is developed. As a result, we obtained the films, which possess the advantages of magnetron-sputtered layers and can be used as contact layers to $p$-type GaN in LEDs for the blue and nearultraviolet (near-UV) spectral ranges.

Received: 28.05.2013
Accepted: 04.06.2013


 English version:
Semiconductors, 2014, 48:1, 58–62

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