Abstract:
It is shown that the significant change of hole mobility in a two-dimensional hole gas under H-terminated surface of artificial diamond by the variation of a strong orthogonal electric field detected lately can be used for the creation of a high-speed diamond field-effect transistor. According to calculations made for realistic parameters of such a device the time of more than 50% modulation of source-drain current by gate voltage rapidly decreases with the increase of the hole sheet density in the subsurface conduction channel formed by this gas and for its value 7 $\cdot$ 10$^{13}$ cm$^{-2}$ achieves 7 ps.