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Fizika i Tekhnika Poluprovodnikov, 2024 Volume 58, Issue 4, Pages 185–191 (Mi phts6738)

XXVIII International Symposium ''Nanophysics and Nanoelectronics'', Nizhny Novgorod, 11-15 March 2024

Formation of self-assembled quantum dots during GaSbP deposition on AlP surface

D. S. Abramkinab, M. O. Petrushkova, D. B. Bogomolova, E. A. Emelyanova, M. A. Putyatoa, V. V. Preobrazhenskiia

a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, 630090 Novosibirsk, Russia
b Novosibirsk State University, 630090 Novosibirsk, Russia

Abstract: Formation process of the self-assembled GaSbP quantum dots (QDs) on the AlP(100) surface from flows of Sb$_4$, P$_2$ and Ga atoms was investigated by reflection high-energy electron diffraction technique. The dependences of the QDs nucleation critical thickness $(D_{\mathrm{eff}})$, the elastic deformations in QDs and the composition of the GaSbP alloy of QDs, on the substrate temperature $(T_S)$ and the pressure ratio in the flows of Sb$_4$ and P$_2$ molecules ($P$(Sb$_4$) : $P$(P$_2$)) was studied. It was found that in wide ranges of $T_S$ and $P$(Sb$_4$):$P$(P$_2$) values (380–460$^\circ$C and 0.07–27 accordingly), unstrained GaSbP/AlP quantum dots are formed.

Keywords: quantum dots, molecular beam epitaxy, solid alloy, plastic strain relaxation.

Received: 15.04.2024
Revised: 20.06.2024
Accepted: 20.06.2024

DOI: 10.61011/FTP.2024.04.58542.6330H



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