This article is cited in 12 papers

XV International Conference ''Thermoelectrics and Their Applications-2016 St. Petersburg'', November 15-16, 2016

Measurement of the thickness of block-structured bismuth films by atomic-force microscopy combined with selective chemical etching

E. V. Demidov, V. A. Komarov, A. N. Krushelnitckii, A. V. Suslov

Herzen State Pedagogical University of Russia, St. Petersburg

Abstract: A method for measuring the thickness of block-structured films by atomic-force microscopy and selective chemical etching is proposed. The method is tested for thin bismuth films formed on mica by thermal evaporation in vacuum.

Received: 27.12.2016
Accepted: 12.01.2017

DOI: 10.21883/FTP.2017.07.44631.17

 English version: Semiconductors, 2017, 51:7, 840–842

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