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Fizika i Tekhnika Poluprovodnikov, 2017 Volume 51, Issue 11, Pages 1538–1542 (Mi phts6004)

This article is cited in 1 paper

XXI International Symposium ''Nanophysics And Nanoelectronics'', Nizhny Novgorod, March 13-16, 2017

Capacitance spectroscopy of hole traps in high-resistance gallium-arsenide structures grown by liquid-phase epitaxy

A. V. Murela, V. B. Shmagina, V. L. Kryukovb, S. S. Strelchenkob, E. A. Suroveginaa, V. I. Shashkina

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b "MeGa Epitech", Kaluga

Abstract: Three deep acceptor levels with activation energies of $\sim$0.7, $\sim$0.41, and $\sim$0.16 eV are found in GaAs structures, which have the hole type of conductivity and are grown by liquid-phase epitaxy, by the methods of capacitance spectroscopy (admittance spectroscopy and deep-level transient spectroscopy). The first two levels are known as HL2 and HL5 and are related to the features of GaAs-layer growth by liquid-phase epitaxy. They are effective recombination centers determining reverse currents in $p$$i$$n$ diodes, which is confirmed by studying the temperature dependences of reverse currents. The level with the energy $E_v$ + 0.16 eV can be related to the two-charge acceptor level of the inherent antisite defect in GaAs, which also determines the doping concentration of structures in the singly charged state.

Received: 27.03.2017
Accepted: 12.05.2017

DOI: 10.21883/FTP.2017.11.45107.21


 English version:
Semiconductors, 2017, 51:11, 1485–1489

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