E. B. Gorokhov, K. N. Astankova, I. A. Azarov, V. A. Volodin, A. V. Latyshev, “New method of porous Ge layer fabrication: structure and optical properties”, Fizika i Tekhnika Poluprovodnikov, 2018, Volume 52, Issue 5,Page 517

This article is cited in 2 papers

XXV International Symposium ''Nanostructures: Physics and Technology'', Saint Petersburg, June 26-30, 2017
Nanostructure Technology

New method of porous Ge layer fabrication: structure and optical properties

E. B. Gorokhov^a, K. N. Astankova^a, I. A. Azarov^ab, V. A. Volodin^ab, A. V. Latyshev^ab

^a Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, 630090 Novosibirsk, Russia
^b Novosibirsk State University, 630090 Novosibirsk, Russia

Abstract: Porous germanium films were produced by selective removal of the GeO$_2$ matrix from the GeO$_2\langle$Ge–NCs$\rangle$ heterolayer in deionized water or HF. On the basis of Raman and infrared spectroscopy data it was supposed that a stable skeletal framework from agglomerated Ge nanoparticles (amorphous or crystalline) was formed after the selective etching of GeO$_2\langle$Ge–NCs$\rangle$ heterolayers. The kinetics of air oxidation of amorphous porous Ge layers was investigated by scanning ellipsometry. Spectral ellipsometry allowed estimating the porosity of amorphous and crystalline porous Ge layers, which was $\sim$70 and $\sim$80%, respectively.

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