Spectroscopy, interaction with radiation

Properties of compliant porous silicon-based substrates formed by two-stage etching

P. V. Seredin^a, A. S. Len'shin^a, Abduljabbar Riyad Khuder^b, D. L. Goloshchapov^a, M. A. Kharajidi^a, I. N. Arsent'ev^c, I. A. Kasatkin<sup>d

a</sup> Voronezh State University
^b Ministry of Education/General Directorate of Education in Baghdad, The third Karkh Governorate, Iraq
^c Ioffe Institute, St. Petersburg
^d Saint Petersburg State University

Abstract: We report on the effect of etching modes and their combination on the design, microstructural and optical properties of pliable substrates based on porous silicon. Based on the data of a complex of microstructural and spectroscopic methods of analysis, it was shown that, with constant parameters of the crystal lattice, the value of residual stresses, crystallite size, volume of the crystalline fraction, as well as the reflectivity and energy of direct transitions in the porous silicon layer depend on the combination of etching modes, but not always correlate with the value of the layer porosity calculated from the analysis of SEM images.

Keywords: Si, porous layer, pliable substrate.

Received: 05.07.2021
Revised: 12.07.2021
Accepted: 12.07.2021

DOI: 10.21883/FTP.2021.11.51555.9707

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