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// Fizika i Tekhnika Poluprovodnikov
// Archive
Fizika i Tekhnika Poluprovodnikov,
1992
Volume 26,
Issue 1,
Pages
111–121
(Mi phts4561)
kinetics of silicon oxidation and structure of oxide layers of thickness less than 50 Angströms
A. Ya. Vul'
,
T. L. Makarova
,
V. Yu. Osipov
,
Yu. S. Zinchik
,
S. K. Boitsov
Ioffe Institute, St. Petersburg
Received:
06.08.1991
Accepted:
09.08.1991
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Steklov Math. Inst. of RAS
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