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JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 1992 Volume 26, Issue 1, Pages 111–121 (Mi phts4561)

kinetics of silicon oxidation and structure of oxide layers of thickness less than 50 Angströms

A. Ya. Vul', T. L. Makarova, V. Yu. Osipov, Yu. S. Zinchik, S. K. Boitsov

Ioffe Institute, St. Petersburg

Received: 06.08.1991
Accepted: 09.08.1991



© Steklov Math. Inst. of RAS, 2026