K. S. Daliev, A. A. Lebedev, V. Ekke, “Evaluation of the Profile of Silicon Oxidation-Degree Distribution in Si$-$SiO$_{2}$ Transient Layers”, Fizika i Tekhnika Poluprovodnikov, 1985, Volume 19, Issue 6,Pages 1156

JOURNALS // Fizika i Tekhnika Poluprovodnikov // Archive

Fizika i Tekhnika Poluprovodnikov, 1985 Volume 19, Issue 6, Pages 1156–1158 (Mi phts1283)

Short Notes

Evaluation of the Profile of Silicon Oxidation-Degree Distribution in Si$-$SiO$_{2}$ Transient Layers

K. S. Daliev, A. A. Lebedev, V. Ekke

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