Abstract:
In this work, nickel sulfide thin films were synthesized via the SILAR method using different nickel salts as precursors. The influence of the precursor salt on the morphology and electrochemical performance of the layers was systematically investigated. SEM analysis revealed that NiSx films prepared from nickel chloride exhibited the most uniform and crack-free morphology. Electrochemical measurements demonstrated a strong correlation between film quality and capacitive behaviour. Notably, the NiS$_x$ electrode synthesized using nickel chloride achieved a maximum specific capacitance of 1902 F/g at a current density of 1 A/g. These findings highlight the critical role of precursor selection in optimizing the structural and electrochemical properties of nickel sulfide electrodes for energy storage applications.
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