This article is cited in 1 paper

Mathematical models of phenomena and processes

Modellinc and optimization of the optical schemes of the photolithography systems

K. A. Valiev^a, H. Zeyfarth, D. R. Ilkayev^a, T. M. Makhviladze<sup>a

a</sup> Insitute of Physics and Technology of Academy of Sciences of the USSR

Abstract: On the base of the criteria of image quality the optimization of the aperture of irradiation source in contact lithography systems is performed. Methods of enhancing focus latitude and supression of chromatic aberrarion effects in projection printing are also under investigation. A brief review of perspective technological methods is presented.

UDC: 621.382.002

Received: 05.07.1989