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JOURNALS
// Matematicheskoe modelirovanie
// Archive
Mat. Model.,
1998
Volume 10,
Number 7,
Pages
21–24
(Mi mm1299)
This article is cited in
1
paper
Mathematical models and computer experiment
Implantation regime influence upon parameters of
$\mathrm{Si0}_2$
films on silicon
T. A. Kholomina
Ryazan State Radiotechnical Academy
Abstract:
Regressional equations shown the implantation regime influence upon value of mobile charge, dielectric constant and electrical resistance of
$\mathrm{Si0}_2$
films on silicon are obtained.
Received:
22.01.1998
Fulltext:
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Steklov Math. Inst. of RAS
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