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JOURNALS // Matematicheskoe modelirovanie // Archive

Mat. Model., 1998 Volume 10, Number 7, Pages 21–24 (Mi mm1299)

This article is cited in 1 paper

Mathematical models and computer experiment

Implantation regime influence upon parameters of $\mathrm{Si0}_2$ films on silicon

T. A. Kholomina

Ryazan State Radiotechnical Academy

Abstract: Regressional equations shown the implantation regime influence upon value of mobile charge, dielectric constant and electrical resistance of $\mathrm{Si0}_2$ films on silicon are obtained.

Received: 22.01.1998



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