This article is cited in 16 papers

Communications

Photooxidation of arsenic(III) in the presence of fulvic acid

W. Ding^a, T. E. Romanova^bc, I. P. Pozdnyakov^cd, V. A. Salomatova^d, M. V. Parkhats^e, B. M. Dzhagarov^e, E. M. Glebov^cd, F. Wu^a, O. V. Shuvaeva<sup>bc

a</sup> Department of Environmental Science, Wuhan University, Wuhan, Hubei, P. R. China
^b A.V. Nikolaev Institute of Inorganic Chemistry, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, Russian Federation
^c Novosibirsk State University, Novosibirsk, Russian Federation
^d V.V. Voevodsky Institute of Chemical Kinetics and Combustion, Siberian Branch of the Russian Academy of Sciences, Novosibirsk, Russian Federation
^e B.I. Stepanov Institute of Physics, National Academy of Sciences of Belarus, Minsk, Belarus

Abstract: The quantum yield of As^III oxidation caused by the UV photolysis (282nm) of fulvic acid H108498 in aqueous solution was measured and a qualitative model explaining its dependence upon pH and As^III concentration was suggested.

Language: English

DOI: 10.1016/j.mencom.2016.05.016

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