Abstract:
The possibility of multiparametric determination of properties of structures from the data on the dependence of reflectances $R_p$ and $R_s$ for polarized radiation and ratio $R_p/R_s$ on the angle of incidence $\theta$ and from the angular dependence $1/R_p(\Delta R/\Delta\theta)$ is investigated. The results of natural and computer experiments revealed a high sensitivity of the angular dependence $R_p(\theta)$ of the reflectance to the values of optical constants and thickness of layered structures. Quantitative results of multiparametric measurements are verified by the independent method of spectral ellipsometry. The possibility of multiparametric determination of the properties and thickness of nanometer dielectric, metallic, and semiconducting layers on various substrates and the properties of substrates in such structures is established.
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