Abstract:
The design of an additional thermal and electric shield intended to improve the quality (crystal lattice, thickness uniformity) of deposited films is described. This shield makes it possible to use a more powerful heat source to heat a substrate and to optimize epitaxial film growth. Simultaneously, the shield plays the role of an additional anode, which changes the plasma dynamics in the working space and homogenizes the radial distribution of the neutral particle flux density from a target to a substrate.