N. A. Feoktistov, V. I. Sakharov, I. T. Serenkov, V. A. Tolmachev, I. V. Korkin, A. E. Aleksenskii, A. Ya. Vul', V. G. Golubev, “Aerosol deposition of detonation nanodiamonds used as nucleation centers for the growth of nanocrystalline diamond films and isolated particles”, Zhurnal Tekhnicheskoi Fiziki, 2011, Volume 81, Issue 5,Pages <nobr>132

This article is cited in 18 papers

Surfaces, Electron and Ion Emission

Aerosol deposition of detonation nanodiamonds used as nucleation centers for the growth of nanocrystalline diamond films and isolated particles

N. A. Feoktistov, V. I. Sakharov, I. T. Serenkov, V. A. Tolmachev, I. V. Korkin, A. E. Aleksenskii, A. Ya. Vul', V. G. Golubev

Ioffe Institute, St. Petersburg

Abstract: The aerosol deposition of detonation nanodiamonds (DNDs) on a silicon substrate is comprehensively studied, and the possibility of subsequent growth of nanocrystalline diamond films and isolated particles on substrates coated with DNDs is demonstrated. It is shown that a change in the deposition time and the weight concentration of DNDs in a suspension in the range 0.001–1% results in a change in the shape of DND agglomerates and their number per unit substrate surface area $N_s$ from 10$^8$ to 10$^{11}$ cm$^{-2}$. Submicron isolated diamond particles are grown on a substrate coated with DND agglomerates at $N_s\approx$ 10$^8$ cm$^{-2}$ using microwave plasma-enhanced chemical vapor deposition. At $N_s\approx$ 10$^{10}$ cm$^{-2}$, thin ($\sim$100 nm) nanodiamond films with a root-mean-square surface roughness less than 15 nm are grown.

Received: 21.10.2010