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Zhurnal Tekhnicheskoi Fiziki, 2012 Volume 82, Issue 7, Pages 134–136 (Mi jtf8885)

This article is cited in 13 papers

Brief Communications

Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film

A. E. Komlev, V. I. Shapovalov, N. S. Shutova

Saint Petersburg Electrotechnical University "LETI"

Abstract: A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.

Received: 17.08.2011


 English version:
Technical Physics, 2012, 57:7, 1030–1033

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