XXIX Symposium "Nanophysics and Nanoelectronics" in Nizhny Novgorod, March 10-14, 2025
Photonics

Fabrication of a blazed diffraction grating with variable line space

D. V. Mokhov^a, T. N. Berezovskaya^a, K. Yu. Shubina^a, E. V. Pirogov^a, N. D. Prasolov^b, L. I. Goray^acde, A. D. Bouravlev<sup>bcd

a</sup> Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
^b Ioffe Institute, St. Petersburg
^c Institute for Analytical Instrumentation, Russian Academy of Sciences, St. Petersburg
^d Saint Petersburg Electrotechnical University "LETI"
^e Space Research Institute, Russian Academy of Sciences, Moscow

Abstract: Variable line spacing (VLS) blazed gratings were fabricated on silicon substrates using direct laser lithography and anisotropic wet etching. The grating parameters were monitored during fabrication using scanning electron microscopy and atomic force microscopy. The paper reports on the fabrication details and characteristics of VLS-grating prototypes with different blaze angles for a solar-blind UV polychromator.

Keywords: Si diffraction grating, variable line spacing grating, blaze angle, triangle line profile, atomic force microscopy, scanning electron microscopy, UV.

Received: 29.04.2025
Revised: 29.04.2025
Accepted: 29.04.2025

DOI: 10.61011/JTF.2025.10.61339.75-25

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