RUS  ENG
Full version
JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive

Zhurnal Tekhnicheskoi Fiziki, 2013 Volume 83, Issue 6, Pages 66–70 (Mi jtf8458)

This article is cited in 17 papers

Physical electronics

Electron spectroscopy of the nanostructures created in Si, GaAs, and CaF$_2$ surface layers using low-energy ion implantation

B. E. Umirzakov, D. A. Tashmukhamedova, D. M. Muradkabilov, Kh. Kh. Boltaev

Tashkent State Technical University named after Islam Karimov

Abstract: A review of the experimental results on the study of the Si, GaAs, and CaF$_2$ surface layers that are created using the low-energy ion implantation is presented. Optical and electron spectroscopy and microscopy are employed in the experiments.

Received: 31.10.2012


 English version:
DOI: 10.1134/S1063784213060261

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2026