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Zhurnal Tekhnicheskoi Fiziki, 2025 Volume 95, Issue 9, Pages 1825–1835 (Mi jtf8320)

XXIX Symposium "Nanophysics and Nanoelectronics" in Nizhny Novgorod, March 10-14, 2025
Electrophysics

Ion beam machine for correction and aspherization of the surface shape of optical elements UIP-300

A. E. Pestov, M. S. Mikhailenko, A. K. Chernyshev, N. I. Chkhalo, I. G. Zabrodin, A. I. Nikolaev, I. A. Kas'kov, E. S. Antushin

Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod

Abstract: An ion-beam machine for correction and aspherization of the surface shape of optical elements for industrial applications (UIP-300) is described. The machine is equipped with three accelerated ion sources (two with focusing ion beam and one with high-current wide-aperture quasi-parallel ion beam) and a goniometer with five degrees of freedom. The realized concept of the movable workpiece made it possible to combine all the methods of ion beam surface treatment (polishing, aspherization, correction and preoperative cleaning) in one installation, as well as to carry out the indicated operations sequentially (without vacuuming the chamber). Accelerated ion sources have been tested, the size of the ion beam and the distribution of the ion current along the aperture of the sources have been determined. It is shown that the available beam sizes from 2.1 to 25 mm and ion currents from 0.3 to 40 mA make it possible to correct the shape of surfaces of any shape and size with both small and significant material removal, and lateral inhomogeneities from tens of millimeters to hundredths of a micron (spatial frequency range up to 9.5 $\times$ 10$^{-4}$ $\mu$m$^{-1}$).

Keywords: ion source, ion-beam etching, ion-beam shape correction, roughness.

Received: 26.05.2025
Revised: 26.05.2025
Accepted: 26.05.2025

DOI: 10.61011/JTF.2025.09.61244.82-25



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© Steklov Math. Inst. of RAS, 2026