Abstract:
This work proposes a precise technique for the vanadium dioxide crystalline nanostructures formation from thin solid amorphous vanadium oxide films grown on silicon substrates. High accuracy of the formed nanoscale structures is achieved via using atomic layer deposition and oxidation scanning probe lithography methods. The amorphous nanostructures undergo crystallization following temperature annealing in vacuum. The size of the formed nanocrystals is defined by the thickness of the initial amorphous film and the geometry of the amorphous nanostructures. In this work we obtained single polycrystalline nanostructures and ordered arrays of nanostructures. Lateral dimensions of crystalline nanostructures are less than 100 nm. The single vanadium dioxide nanocrystals are less than 5 nm in height and less than 50 nm in diameter.
Fulltext:
PDF file (598 kB)