This article is cited in 8 papers

Physical electronics

Dissolution of a silver film in silicon glasses under electron bombardment

V. S. Brunov^a, O. A. Podsvirov^b, A. I. Sidorov^a, M. A. Prosnikov<sup>b

a</sup> St. Petersburg National Research University of Information Technologies, Mechanics and Optics
^b Peter the Great St. Petersburg Polytechnic University

Abstract: It is shown that the under the action of an electron beam with electron energy $E >$ 10 keV and electron irradiation dose $Q\ge$ 20 mQ/cm$^2$ on silicate glasses coated with a silver film 80–100 nm in thickness, the silver film is dissolved partially or completely. The main mechanisms inducing this effect are the formation of a negative space charge under the glass surface, field emission of positive silver ions from the field, and migration of silver ions to the space charge region.

Received: 19.03.2014

 English version: Technical Physics, 2014, 59:12, 1863–1868

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