RUS  ENG
Full version
JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive

Zhurnal Tekhnicheskoi Fiziki, 2014 Volume 84, Issue 12, Pages 8–12 (Mi jtf8271)

Theoretical and Mathematical Physics

Mathematical simulation of the temperature profile of metal films under pulsed photon annealing

V. N. Nechaev, A. V. Shuba

Voronezh State Technical University

Abstract: The exact solution to the system of heat conduction equations for the electron and phonon subsystem is obtained using the thermal peak model; the temperature of the film subjected to incoherent optical irradiation is determined. The effects of thermal contact with surroundings and electromagnetic radiation damping on the spatial temperature distribution in an aluminum film are analyzed. Recommendations are given for the choice of the optimal regime of the photon annealing.

Received: 20.09.2013
Accepted: 22.01.2014


 English version:
Technical Physics, 2014, 59:12, 1744–1748

Bibliographic databases:


© Steklov Math. Inst. of RAS, 2026