This article is cited in 4 papers

Plasma

Joint functioning of a magnetron sputtering system and an end-Hall ion source

D. A. Golosov^a, B. Eungsun^b, S. M. Zavadski<sup>a

a</sup> Belarussian State University of Computer Science and Radioelectronic Engineering
^b Korea Institute of Materials Science, Plasma Coating Technology Department, 642-831, Republic of Korea, Changwon, 797 Changwon-Daero, Sungsan-Gu

Abstract: The features of joint operation of a magnetron sputtering system (MSS) and an end-Hall ion source (EHIS) are investigated. It is noted that the initiation of the magnetron discharge leads to partial or complete neutralization of the ion beam generated by the EHIS; in other words, in some regimes of the MSS, the ion source operates in the filament-free regime. In such a case, the magnetron discharge is the source of electrons required for sustaining the discharge and for compensating the ion beam from the EHIS. The dependences of the discharge characteristics of the EHIS and MSS are established when a filament neutralizer and MSS discharge are used for compensating the EHIS ion beam. The balance of currents in the ion source-magnetron sputtering system is considered by analyzing the joint functioning of the MSS and EHIS. It is shown that the maximal discharge current from the ion source for which the charge compensation condition is preserved depends on the unbalance and the magnetron discharge current.

Received: 28.11.2013

 English version: Technical Physics, 2014, 59:9, 1326–1333

Bibliographic databases:

•