Abstract:
The kinetics of self-organization of nanodomains during the deposition of submonolayer carbon coatings on (100) silicon in the microwave plasma of low-pressure ethanol vapors is studied by atomic force microscopy and scanning electron microscopy. The laws of influence of the substrate temperature and the kinetic energy of carbon-containing ions on the mechanisms of formation and structuring of the forming silicon-carbon surface phases are established. It is shown that the deposited carbon-containing nanodomains can be used as nonlithographic mask coatings for the formation of spatial low-dimensional systems on single-crystal silicon upon selective highly anisotropic plasma-chemical etching.
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